《硅表面及界面的形成(英文版)》内容简介：Silicon is the material of choice of the multibillion semiconductor industry. Ongoing miniaturization of microelectronic devices drives critical regions of integrated circuits ever closer to the place where the silicon ends and another material begins, to the interracial region. Performance and reliability of electronic microelements depend more and more on the microscopic quality of the interfaces and on the microscopic-scale quality of the original Si surfaces. Suffice to say that as soon as in the first decade of the coming millenium the customers will be offered microelectronic chips with minimum features about hundred atoms long and a couple of atoms thick! Small wonder that atomic-scale knowledge is gaining a commercial value.
具体描述
读后感
评分
评分
评分
评分
用户评价
相关图书
本站所有内容均为互联网搜索引擎提供的公开搜索信息，本站不存储任何数据与内容，任何内容与数据均与本站无关，如有需要请联系相关搜索引擎包括但不限于百度，google,bing,sogou 等
© 2025 book.wenda123.org All Rights Reserved. 图书目录大全 版权所有