X-Ray Metrology in Semiconductor Manufacturing 在线电子书 pdf 下载 txt下载 epub 下载 mobi 下载 2024

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D. Keith Bowen 作者

CRC

译者

2006-01-24 出版日期

296 页数

USD 144.95 价格

Hardcover

丛书系列

9780849339288 图书编码

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X-Ray Metrology in Semiconductor Manufacturing 在线电子书 epub 下载 mobi 下载 pdf 下载 txt 下载 2024

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X-Ray Metrology in Semiconductor Manufacturing 在线电子书图书描述

The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), "X-Ray Metrology in Semiconductor Manufacturing" is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, "X-Ray Metrology in Semiconductor Manufacturing" provides real solutions with a focus on accuracy, repeatability, and throughput.

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