Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 pdf 下載 txt下載 epub 下載 mobi 下載 2024


Principles of Plasma Discharges and Materials Processing , 2nd Edition

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Michael A. Lieberman 作者
Wiley-Interscience
譯者
2005-04-14 出版日期
800 頁數
USD 126.00 價格
Hardcover
叢書系列
9780471720010 圖書編碼

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Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 epub 下載 mobi 下載 pdf 下載 txt 下載 2024

Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 epub 下載 pdf 下載 mobi 下載 txt 下載 2024

Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 pdf 下載 txt下載 epub 下載 mobi 下載 2024



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Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 著者簡介


Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 著者簡介


Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 pdf 下載 txt下載 epub 下載 mobi 在線電子書下載

Principles of Plasma Discharges and Materials Processing , 2nd Edition 在線電子書 圖書描述

A Thorough Update of the Industry Classic on Principles of Plasma Processing

The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.

The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.

New and expanded topics include:

* Updated cross sections

* Diffusion and diffusion solutions

* Generalized Bohm criteria

* Expanded treatment of dc sheaths

* Langmuir probes in time-varying fields

* Electronegative discharges

* Pulsed power discharges

* Dual frequency discharges

* High-density rf sheaths and ion energy distributions

* Hysteresis and instabilities

* Helicon discharges

* Hollow cathode discharges

* Ionized physical vapor deposition

* Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

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