The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. "Principles of Vapor Deposition of Thin Films" brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. It offers detailed derivation of important formulae. It thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention is paid to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
具体描述
读后感
评分
评分
评分
评分
用户评价
相关图书
本站所有内容均为互联网搜索引擎提供的公开搜索信息，本站不存储任何数据与内容，任何内容与数据均与本站无关，如有需要请联系相关搜索引擎包括但不限于百度，google,bing,sogou 等
© 2025 book.wenda123.org All Rights Reserved. 图书目录大全 版权所有