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Handbook of Chemical Vapor Deposition 在线电子书 pdf 下载 txt下载 epub 下载 mobi 下载 2024

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Pierson, Hugh O. 作者

William Andrew Pub

译者

2000-1 出版日期

508 页数

$ 242.95 价格

HRD

丛书系列

9780815514329 图书编码

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Handbook of Chemical Vapor Deposition 在线电子书 epub 下载 mobi 下载 pdf 下载 txt 下载 2024

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Handbook of Chemical Vapor Deposition 在线电子书 pdf 下载 txt下载 epub 下载 mobi 在线电子书下载

Handbook of Chemical Vapor Deposition 在线电子书图书描述

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

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