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Ion Implantation and Synthesis of Materials 在線電子書 pdf 下載 txt下載 epub 下載 mobi 下載 2024

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Nastasi, M. 作者

Springer Verlag

譯者

出版日期

277 頁數

$ 168.37 價格

HRD

叢書系列

9783540236740 圖書編碼

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發表於2024-12-24

Ion Implantation and Synthesis of Materials 在線電子書 epub 下載 mobi 下載 pdf 下載 txt 下載 2024

Ion Implantation and Synthesis of Materials 在線電子書 epub 下載 pdf 下載 mobi 下載 txt 下載 2024

Ion Implantation and Synthesis of Materials 在線電子書 pdf 下載 txt下載 epub 下載 mobi 下載 2024

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Ion Implantation and Synthesis of Materials 在線電子書 pdf 下載 txt下載 epub 下載 mobi 在線電子書下載

Ion Implantation and Synthesis of Materials 在線電子書圖書描述

Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Ion Implantation and Synthesis of Materials 在線電子書下載 mobi epub pdf txt 在線電子書下載

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