Photomask Fabrication Technology 在线电子书 pdf 下载 txt下载 epub 下载 mobi 下载 2025

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Eynon 作者

McGraw-Hill Professional

译者

2005-8 出版日期

500 页数

$ 149.16 价格

丛书系列

9780071445634 图书编码

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发表于2025-01-01

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Photomask Fabrication Technology 在线电子书 epub 下载 mobi 下载 pdf 下载 txt 下载 2025

Photomask Fabrication Technology 在线电子书 pdf 下载 txt下载 epub 下载 mobi 下载 2025

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Photomask Fabrication Technology 在线电子书图书描述

Photomasks are defect-free optical templates - the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book. This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state-of-the-art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes.

Photomask Fabrication Technology 在线电子书下载 mobi epub pdf txt 在线电子书下载

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