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High Density Plasma Sources 在线电子书 pdf 下载 txt下载 epub 下载 mobi 下载 2024

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Popov, Oleg A. 编作者

William Andrew Pub

译者

1997-1 出版日期

468 页数

$ 214.70 价格

HRD

丛书系列

9780815513773 图书编码

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发表于2024-09-20

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High Density Plasma Sources 在线电子书 epub 下载 mobi 下载 pdf 下载 txt 下载 2024

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High Density Plasma Sources 在线电子书图书描述

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

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